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Although the psychological effects of appearance schemas have been studied in the general population, we know little about the relation of these schemas to appearance-based rejection sensitivity. This study examined the relations among predictive variables of appearance-invested self-schemas (self-evaluative salience [SES] and motivational salience [MS]), appearance-based rejection sensitivity, and depressive affect. Self-discrepancy theory was used to theorize that when individuals experience discrepancies with self, conflict arises in self-schemas, and that this conflict relates to an increase in depressive affect and appearance-based rejection sensitivity. The sample consisted of 131 adult female college students participating in a continuing education program. Multiple regression was used to evaluate the relation between appearance-invested self-schema and depressive affect. A second multiple regression equation was conducted to evaluate the relation between appearance-invested self-schema and appearance-based rejection sensitivity. Participants with higher SES scores had significantly higher depressive affect scores and appearance-based rejection sensitivity scores. Participants with higher MS scores had significantly lower depressive affect and appearance-based rejection sensitivity scores. High SES significantly predicted more depression and sensitivity to rejection based on appearance, and high MS appeared to be a protective factor against depression and appearance based rejection. The results of the study promote positive social change by helping professionals improve treatments for individuals suffering from negative appearance-invested self-schemas, rejection sensitivity, and depression.
Toosi, Mandana, "Self-Evaluative Salience and Motivational Salience as Predictors of Depressive Affect and Appearance Based Rejection Sensitivity." (2016). Walden Dissertations and Doctoral Studies. 2386.